2012-05-24Provision of a Silicon Etch System (University College Cork (UCC))
Due to the high rate of utilisation of the present MEMS Silicon etch system at Tyndall, a requirement has been identified to source a second deep silicon etch system for MEMS applications (Microsystems Fabrication) in the CFF. This system must match or enhance the current Silicon Etch capabilities at Tyndall.
The system must be versatile and allow for upgrades as our needs change. In addition, ongoing commitment to support process development projects, as well as prompt field service support must be โฆ
View the procurement ยป Mentioned suppliers:Oxford Instruments Plasma Technology