CRANN, TCD is seeking to procure a state-of-the-art sputter deposition tool โ โTrifolium Dubiumโ for the development of materials and thin film devices. Magnetic tunnel junctions and Heusler alloys are expected to be a major component of the research conducted using this system, as well as blanket films and stacks of novel multiferroics, magnetic and/or transparent oxides. The system will be the core of a national access facility and will be available for use by a large number of research groups in both academia and industry, and as such performance and flexibility are paramount.
The requirement will be divided into three (3) Lots. It would be envisaged that the three (3) lots will be broken down as follows:
Lot 1: Sputter Chamber #1;
Lot 2: XPS Chamber;
Lot 3: Water Transfer System Arrangement and Vacuum.
Deadline
The time limit for receipt of tenders was 2016-07-13.
The procurement was published on 2016-06-10.
Additional information (2016-06-21) Contracting authority Name and addresses
Name: Education Procurement Service (EPS)
National registration number: IE 6609370 G
Postal address: University of Limerick, Plassey, Co. Limerick
Postal town: Limerick
Country: Ireland ๐ฎ๐ช
Contact person: Philip Gurnett
Phone: +353 61213488๐
E-mail: philip.gurnett@ul.ie๐ง
Region: ie023 ๐๏ธ
URL: http://www.ul.ie/edps๐
Address of the buyer profile: https://irl.eu-supply.com/ctm/Company/CompanyInformation/Index/87073๐
Object Scope of the procurement
Title: Sputter Desposition Tool for Trinity College Dublin.
LEE091C
Products/services: Laboratory, optical and precision equipments (excl. glasses)๐ฆ
Short description:
โCRANN, TCD is seeking to procure a state-of-the-art sputter deposition tool โ โTrifolium Dubiumโ for the development of materials and thin film devices....โ
Short description
CRANN, TCD is seeking to procure a state-of-the-art sputter deposition tool โ โTrifolium Dubiumโ for the development of materials and thin film devices. Magnetic tunnel junctions and Heusler alloys are expected to be a major component of the research conducted using this system, as well as blanket films and stacks of novel multiferroics, magnetic and/or transparent oxides. The system will be the core of a national access facility and will be available for use by a large number of research groups in both academia and industry, and as such performance and flexibility are paramount.
The requirement will be divided into three (3) Lots. It would be envisaged that the three (3) lots will be broken down as follows:
Lot 1: Deposition Chambers and Wafer Transfer System
Lot 2: XPS Chamber
Lot 3: Laser for PLD chamber.
Complementary information Original notice reference
Notice number in the OJ S: 2016/S 113-200771
Changes Text to be corrected in the original notice
Section number: II.1.5
Place of text to be modified: Estimated total value:
Old value
Text: Value excluding VAT: 3 240 000.00 EUR
New value
Text: Value including VAT: 3 240 000.00 EUR
Text to be corrected in the original notice
Section number: II.2.1
Place of text to be modified: Title:
Old value
Text: Sputter Chamber 1 โ Desposition System.
New value
Text: Deposition system and Wafer Transfer.
Text to be corrected in the original notice
Section number: II.2.14
Place of text to be modified: Additional information:
Old value
Text: Sputter Disposition Tool for TCD required. See PQQ for details.
New value
Text: Sputter Deposition Tool for TCD required. See PQQ for details.
Source: OJS 2016/S 121-214926 (2016-06-21)