Chemical Vapour Deposition (CVD) System
CVD tool should be able to synthesize carbon based, TMD and TMO thin films from gas/liquid/solid precursors. Two approaches must be possible — conversion of metal films and the CVD from metals organic precursors. This requires the possibility to deliver sold precursors and to operate the tool in an Atomic Layer Deposition (ALD) like mode.
Deadline
The time limit for receipt of tenders was 2014-11-24.
The procurement was published on 2014-10-15.
Who?
What?
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Procurement history
| Date |
Document |
| 2014-10-15
|
Contract notice
|